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Plasma Barrel Reactor

The K1050X Plasma Etcher was designed to meet the requirements of research, development and small scale production units covering a wide and varied range of applications. Built to withstand heavy use (24 hours a day for some ashing schedules) with semi-automatic operation, offering durability and simplicity of operation. Barrel systems etch or ash isotropically (in all directions) and are suitable for the majority of applications.

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K1050X plasma reactor with 110mm x 190mm chamber
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